Advanced light trapping interface for a-Si:H thin film

被引:5
|
作者
Nasser, Hisham [1 ,2 ]
Saleh, Zaki M. [1 ,3 ]
Ozkol, Engin [1 ]
Bek, Alpan [1 ,2 ,4 ]
Turan, Rasit [1 ,2 ,4 ]
机构
[1] Middle E Tech Univ, Ctr Solar Energy Res & Applicat GUNAM, Dumlupinar Blvd 1, TR-06800 Ankara, Turkey
[2] Middle E Tech Univ, Micro & Nanotechnol Grad Program, TR-06800 Ankara, Turkey
[3] Arab Amer Univ Jenin, Jenin, Israel
[4] Middle E Tech Univ, Dept Phys, TR-06800 Ankara, Turkey
关键词
localized surface plasmons; light trapping; wet texturing; Al:ZnO; a-Si:H; SOLAR-CELLS; AMORPHOUS SI; EFFICIENCY; NANOPARTICLES; ENHANCEMENT; ABSORPTION;
D O I
10.1002/pssc.201510097
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Surface texturing of transparent conducting oxides and plasmonic interfaces are two important techniques used separately in thin film solar cells to reduce reflection and enhance light-trapping. In this study, we merge the effects of Al:ZnO surface texturing and Ag nanoparticles (AgNPs) plasmonics in a single light-trapping interface to investigate their combined light trapping efficiency on a-Si:H thin film. Light scattered by this interface is optimized by placing a thin SiO2 spacer layer between AgNPs and a-Si: H absorber layer. Our results indicate that the AgNPs embedded in SiO2 significantly enhance absorption at energies close to the band gap of a-Si: H. Surface texturing by wet etching of Al: ZnO combined with AgNP produces the highest optical extinction of a-Si:H thin film at the band edge. Furthermore, the measured photocurrent in a-Si:H shows a clear increase not only at AgNPs resonance wavelength but over the entire wavelength range. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:1206 / 1210
页数:5
相关论文
共 50 条
  • [21] Interface engineering of titanium oxide protected a-Si:H/a-Si:H photoelectrodes for light induced water splitting
    Ziegler, Juergen
    Yang, Florent
    Wagner, Stephan
    Kaiser, Bernhard
    Jaegermann, Wolfram
    Urbain, Felix
    Becker, Jan-Philipp
    Smirnov, Vladimir
    Finger, Friedhelm
    APPLIED SURFACE SCIENCE, 2016, 389 : 73 - 79
  • [22] Analysis of temperature effect on a-Si:H thin film transistors
    Qiang, L.
    Yao, R. H.
    SOLID-STATE ELECTRONICS, 2013, 81 : 13 - 18
  • [23] a-Si:H temperature sensor integrated in a thin film heater
    Caputo, D.
    de Cesare, G.
    Nascetti, A.
    Scipinotti, R.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2010, 207 (03): : 708 - 711
  • [24] Combinatorial fabrication process for a-Si:H thin film transistors
    Aiyer, HN
    Nishioka, D
    Maruyama, R
    Shinno, H
    Matsuki, N
    Miyazaki, K
    Fujioka, H
    Koinuma, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (1AB): : L81 - L83
  • [25] Efficiency improvement of a-Si:H Thin-Film Solar Cells by phosphorus doping of absorption layer with a-Si:H buffer layer at p/i interface
    Son, Won Ho
    Lee, Si-Hun
    Kim, Jae Keon
    Choi, Sie Young
    Kong, Seong Ho
    Jung, Daewoong
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 2018, 676 (01) : 131 - 140
  • [26] Progressive degradation in a-Si:H/SiN thin film transistors
    Merticaru, AR
    Mouthaan, AJ
    Kuper, FG
    THIN SOLID FILMS, 2003, 427 (1-2) : 60 - 66
  • [27] Enzymatic Biosensors with Integrated Thin Film a-Si:H Photodiodes
    Pereira, A. T.
    Chu, V.
    Prazeres, D. M. F.
    Conde, J. P.
    AMORPHOUS AND POLYCRYSTALLINE THIN FILM SILICON SCIENCE AND TECHNOLOGY - 2009, VOL 1153, 2009, 1153
  • [28] Numerical study on the scaling of a-Si:H thin film transistors
    Fathololoumi, Saeed
    Chan, Isaac
    Moradi, Maryam
    Nathan, Arokia
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (03): : 888 - 891
  • [29] Current stress metastability in a-Si:H thin film transistors
    Sultana, A
    Sakariya, K
    Nathan, A
    PHOTONICS NORTH: APPLICATIONS OF PHOTONIC TECHNOLOGY 7B, PTS 1 AND 2: CLOSING THE GAP BETWEEN THEORY, DEVELOPMENT, AND APPLICATION - PHOTONIC APPLICATIONS IN ASTRONOMY, BIOMEDICINE, IMAGING, MATERIALS PROCESSING, AND EDUCATION, 2004, 5578 : 343 - 352
  • [30] Annealing of a-Si:H Thin Film by Rapid Thermal Process
    Wang, Yucang
    Jin, Ruimin
    LIQUID CRYSTALS AND RELATED MATERIALS II, 2012, 181-182 : 409 - +