Advanced light trapping interface for a-Si:H thin film

被引:5
|
作者
Nasser, Hisham [1 ,2 ]
Saleh, Zaki M. [1 ,3 ]
Ozkol, Engin [1 ]
Bek, Alpan [1 ,2 ,4 ]
Turan, Rasit [1 ,2 ,4 ]
机构
[1] Middle E Tech Univ, Ctr Solar Energy Res & Applicat GUNAM, Dumlupinar Blvd 1, TR-06800 Ankara, Turkey
[2] Middle E Tech Univ, Micro & Nanotechnol Grad Program, TR-06800 Ankara, Turkey
[3] Arab Amer Univ Jenin, Jenin, Israel
[4] Middle E Tech Univ, Dept Phys, TR-06800 Ankara, Turkey
关键词
localized surface plasmons; light trapping; wet texturing; Al:ZnO; a-Si:H; SOLAR-CELLS; AMORPHOUS SI; EFFICIENCY; NANOPARTICLES; ENHANCEMENT; ABSORPTION;
D O I
10.1002/pssc.201510097
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Surface texturing of transparent conducting oxides and plasmonic interfaces are two important techniques used separately in thin film solar cells to reduce reflection and enhance light-trapping. In this study, we merge the effects of Al:ZnO surface texturing and Ag nanoparticles (AgNPs) plasmonics in a single light-trapping interface to investigate their combined light trapping efficiency on a-Si:H thin film. Light scattered by this interface is optimized by placing a thin SiO2 spacer layer between AgNPs and a-Si: H absorber layer. Our results indicate that the AgNPs embedded in SiO2 significantly enhance absorption at energies close to the band gap of a-Si: H. Surface texturing by wet etching of Al: ZnO combined with AgNP produces the highest optical extinction of a-Si:H thin film at the band edge. Furthermore, the measured photocurrent in a-Si:H shows a clear increase not only at AgNPs resonance wavelength but over the entire wavelength range. (C) 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:1206 / 1210
页数:5
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