Magnetic tunnel junctions with large tunneling magnetoresistance and small saturation fields

被引:11
|
作者
Egelhoff, W. F., Jr. [1 ]
Hoink, V. E. [1 ]
Lau, J. W. [1 ]
Shen, W. F. [2 ,3 ]
Schrag, B. D. [2 ,3 ]
Xiao, G. [2 ,3 ]
机构
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
[2] Brown Univ, Dept Phys, Providence, RI 02912 USA
[3] Micro Magnet Inc, Fall River, MA 02720 USA
基金
美国国家科学基金会;
关键词
SENSORS;
D O I
10.1063/1.3358609
中图分类号
O59 [应用物理学];
学科分类号
摘要
There is a continuing need for greater sensitivity in magnetic tunnel junction (MTJ) sensors. We have found a new approach to achieving large tunneling magnetoresistance (TMR) with a very soft free layer. The high TMR is achieved by conventional means of annealing a bottom pinned MTJ that has Ta and Ru capping layers. The soft free layer is achieved by etching almost to the MgO tunnel barrier and depositing a thick soft magnetic film. The results are far superior to annealing the MTJ with the thick soft layer already deposited. (C) 2010 American Institute of Physics. [doi:10.1063/1.3358609]
引用
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页数:2
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