Effect of Bis-(3-sulfopropyl) Disulfide and Chloride Ions on the Localized Electrochemical Deposition of Copper Microstructures

被引:10
|
作者
Wang, Fuliang [1 ,2 ]
Li, Yijie [2 ]
He, Hu [1 ,2 ]
Wang, Yan [2 ]
Zhu, Wenhui [1 ,2 ]
Li, Jianping [2 ]
机构
[1] State Key Lab High Performance Complex Mfg, Changsha 410083, Hunan, Peoples R China
[2] Cent S Univ, Sch Mech & Elect Engn, Changsha 410083, Hunan, Peoples R China
关键词
SUPPRESSOR ADDITIVES; CU ELECTRODEPOSITION; FABRICATION; COLUMNS; SPS; MICROFABRICATION; MORPHOLOGY; SURFACES;
D O I
10.1149/2.0781707jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Micrometer copper columns were fabricated using localized electrochemical deposition (LECD) with and without deploying bis-(3-sulfopropyl) disulfide (SPS) and chloride ion (Cl-). In addition to the deposition rate, surface morphology and mechanical properties of deposited copper micro columns were influenced by additives in electrolyte solution. It was found the synergy effect of SPS and Cl-played a key role in determining the morphology and mechanical property of deposited micro structures. In particular, low concentration of SPS promoted a smoother surface, while high concentration of SPS accelerated the deposition process of micro structures with decreased hardness and Young's modulus as well as rough surface morphologies. The potential mechanism on experimental results was discussed on the basis of fundamental chemical reactions in LECD. (C) 2017 The Electrochemical Society. All rights reserved.
引用
收藏
页码:D419 / D424
页数:6
相关论文
共 50 条
  • [21] Thermodynamic aspects of bis(3-sulfopropyl) disulfide and 3-mercapto-1-propanesulfonic acid in Cu electrodeposition
    Shen, Huizi
    Kim, Hoe Chul
    Sung, Minjae
    Lim, Taeho
    Kim, Jae Jeong
    JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2018, 816 : 132 - 137
  • [22] 3-Mercapto-1-propanesulfonic acid and Bis(3-sulfopropyl) Disulfide Adsorbed on Au(111): In Situ Scanning Tunneling Microscopy and Electrochemical Studies
    Jian, Zheng-Yan
    Chang, Teng-Yuan
    Yang, Yaw-Chia
    Dow, Wei-Ping
    Yau, Shueh-Lin
    Lee, Yuh-Lang
    LANGMUIR, 2009, 25 (01) : 179 - 184
  • [23] Effect of Molecular Weight of Polyethylene Glycol on Copper Electrodeposition in the Presence of Bis-3-Sulfopropyl-Disulfide
    Song, Sol-Ji
    Choi, Seok-Ryul
    Kim, Jung-Gu
    Kim, Ho-Gun
    INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, 2016, 11 (12): : 10067 - 10079
  • [24] THE EFFECT OF CHLORIDE IONS ON COPPER DEPOSITION
    GAUVIN, WH
    WINKLER, CA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1952, 99 (02) : 71 - 77
  • [25] Observation of Bis-(3-sulfopropyl) Disulfide (SPS) Breakdown at the Cu Cathode and Insoluble Anode under Open-Circuit, Unpowered Closed-Circuit, and Electrolysis Conditions
    Kim, Tae Young
    Sung, Minjae
    Yoon, Young
    Lee, Kyu Hwan
    Choe, Seunghoe
    Kim, Jae Jeong
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2019, 166 (08) : G61 - G66
  • [26] Effect of Bis-3-Sulfopropyl-Disulfide on the Characteristics of Trivalent Chromium Electrodeposition
    Song, Sol-Ji
    Ko, Sang Jin
    Lee, Jae-Ryung
    Kim, Jung-Gu
    INTERNATIONAL JOURNAL OF ELECTROCHEMICAL SCIENCE, 2018, 13 (08): : 7489 - 7504
  • [27] 3D fabrication of complex copper microstructures with path planning by localized electrochemical deposition
    Wu, Wenzheng
    Tang, Xiaojie
    Guo, Jinyu
    Wang, Jing
    Zhang, Xingbin
    Zhao, Chenghan
    JOURNAL OF APPLIED ELECTROCHEMISTRY, 2025, 55 (02) : 439 - 448
  • [28] 3D fabrication of complex copper microstructures with path planning by localized electrochemical deposition
    Wu, Wenzheng
    Tang, Xiaojie
    Guo, Jinyu
    Wang, Jing
    Zhang, Xingbin
    Zhao, Chenghan
    Journal of Applied Electrochemistry, 2024,
  • [29] Suppression effect of low-concentration bis-(3-sodiumsulfopropyl disulfide) on copper electroplating
    Hung, Chi-Cheng
    Lee, Wen-Hsi
    Chang, Shih-Chieh
    Chen, Kei-Wei
    Wang, Ying-Lang
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2008, 155 (02) : D133 - D136
  • [30] Excitons in molecular aggregates of 3,3'-bis-[3-sulfopropyl]-5,5'-dichloro-9 ethylthiacarbocyanine (THIATS): Temperature dependent properties
    Scheblykin, IG
    Sliusarenko, OY
    Lepnev, LS
    Vitukhnovsky, AG
    Van der Auweraer, M
    JOURNAL OF PHYSICAL CHEMISTRY B, 2001, 105 (20): : 4636 - 4646