GaN epilayers and AlGaN/GaN multiple quantum wells grown on freestanding [1(1)over-bar-00] oriented GaN substrates

被引:0
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作者
Chen, CQ [1 ]
Gaevski, ME [1 ]
Sun, WH [1 ]
Kuokstis, E [1 ]
Yang, JW [1 ]
Simin, G [1 ]
Khan, MA [1 ]
Maruska, HP [1 ]
Hill, DW [1 ]
Chou, MMC [1 ]
Gallagher, JJ [1 ]
Chai, BH [1 ]
Song, JH [1 ]
Ryu, MY [1 ]
Yu, PW [1 ]
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the homoepitaxial growth of GaN on freestanding [1 (1) over bar 00] oriented GaN substrates using metalorganic chemical vapor deposition. A proper pretreatment of the substrates was found to be essential for the GaN homoepitaxy. The influence of growth conditions such as V/III molar-ratio and temperature on the surface morphology and optical properties of epilayers was investigated. Optimized pretreatment and growth conditions led to high quality [1 (1) over bar 00] oriented GaN epilayers with a smooth surface morphology and strong band-edge emission. These layers also exhibited strong room temperature stimulated emission under high intensity pulsed optical pumping. Based on these GaN epilayer, AlGaN/GaN multiple quantum wells have been grown on the freestanding M-plane GaN. Photoluminescence data confirm that built-in electric field for M-plane structures is very weak, and this situation results in a stronger PL intensity in comparison with C-plane multiple quantum wells in tests at low excitation level.
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页码:299 / 304
页数:6
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