Heteroepitaxy of CoSi2 on patterned Si(100) substrates

被引：0
|
作者：
Karpenko, OP [1 ]
Eaglesham, DJ [1 ]
Yalisove, SM [1 ]
机构：
[1] UNIV MICHIGAN,DEPT MAT SCI & ENGN,ANN ARBOR,MI 48109
来源：
SILICIDE THIN FILMS - FABRICATION, PROPERTIES, AND APPLICATIONS | 1996年 / 402卷
关键词：
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：481 / 486
页数：6
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