Steam pressure and velocity effects on high temperature silicon carbide oxidation

被引:10
|
作者
Mouche, Peter A. [1 ]
Terrani, Kurt A. [1 ]
机构
[1] Oak Ridge Natl Lab, POB 2008,MS6138, Oak Ridge, TN 37831 USA
关键词
kinetics; nuclear; oxidation; pressure; SiC; steam; velocity; volatilization; SIO2 SCALE VOLATILITY; COMBUSTION CONDITIONS; RECESSION; BEHAVIOR; GLASS;
D O I
10.1111/jace.16834
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effects of steam pressure, velocity, and composition on SiC oxidation kinetics were studied. Pressure effects were tested at 1200 degrees C from 0.1 to 1.4 MPa at a steam velocity of 0.25 cm/s. Velocity effects were tested in two furnaces at 0.45 MPa, 1200 degrees C and 0.1 MPa, 1600 degrees C with velocities ranging from 0.25 to 137 cm/s. Steam composition was altered by changing the reaction vessel material. Oxide morphology and composition were determined using optical and electron microscopy, and X-ray diffraction. Porous oxides were observed whenever structural SiC from the reaction vessel saturated the steam with volatilized silica, H-2, and CO. Oxidation kinetics were calculated by the change in SiC thickness. The steam velocity/recession rate followed a power-law relationship of similar to 0.35 while the steam pressure/recession rate followed a power-law relationship of similar to 1.78.
引用
收藏
页码:2062 / 2075
页数:14
相关论文
共 50 条
  • [1] Silicon Carbide Oxidation in High-Pressure Steam
    Cheng, Ting
    Tortorelli, Peter F.
    [J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2013, 96 (07) : 2330 - 2337
  • [2] LOW-TEMPERATURE, HIGH-PRESSURE STEAM OXIDATION OF SILICON
    KATZ, LE
    HOWELLS, BF
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (08) : C352 - C352
  • [3] OXIDATION OF SILICON BY HIGH-PRESSURE STEAM
    LIGENZA, JR
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (02) : 73 - 76
  • [4] OXIDATION OF SILICON IN HIGH-PRESSURE STEAM
    TSUBOUCHI, N
    MIYOSHI, H
    NISHIMOTO, A
    ABE, H
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (05) : 855 - 856
  • [5] TEMPERATURE AND OXYGEN PRESSURE DEPENDENCE OF SILICON CARBIDE OXIDATION
    PULTZ, WW
    [J]. JOURNAL OF PHYSICAL CHEMISTRY, 1967, 71 (13): : 4556 - &
  • [6] SELECTIVE OXIDATION OF SILICON IN LOW-TEMPERATURE HIGH-PRESSURE STEAM
    POWELL, RJ
    LIGENZA, JR
    SCHNEIDER, MS
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1974, ED21 (10) : 636 - 640
  • [7] High-temperature oxidation of silicon carbide and silicon nitride
    Narushima, T
    Goto, T
    Hirai, T
    Iguchi, Y
    [J]. MATERIALS TRANSACTIONS JIM, 1997, 38 (10): : 821 - 835
  • [8] High-temperature oxidation of silicon carbide and silicon nitride
    Tohoku Univ, Sendai, Japan
    [J]. Mater Trans JIM, 10 (821-835):
  • [9] Pressure effects on high temperature steam oxidation of zircaloy-4
    Park, K
    Kim, K
    Yoo, T
    Kim, K
    [J]. METALS AND MATERIALS INTERNATIONAL, 2001, 7 (04): : 367 - 373
  • [10] Pressure effects on high temperature steam oxidation of zircaloy-4
    Kwangheon Park
    Kwangpyo Kim
    Taegeun Yoo
    Kyutae Kim
    [J]. Metals and Materials International, 2001, 7 : 367 - 373