Fabrication of X-ray mirror for hard X-ray diffraction limited nanofocusing

被引：0

作者：

Yumoto, Hirokatsu ^{[1
]}

Mimura, Hidekazu ^{[1
]}

Matsuyama, Satoshi ^{[1
]}

Handa, Soichiro ^{[1
]}

Shibatani, Akihiko ^{[1
]}

Katagishi, Keiko ^{[1
]}

Yamamura, Kazuya ^{[1
]}

Sano, Yasuhisa ^{[1
]}

Endo, Katsuyoshi ^{[1
]}

Mori, Yuzo ^{[1
]}

Yabashi, Makina ^{[2
]}

Nishino, Yoshinori ^{[3
]}

Tamasaku, Kenji ^{[3
]}

Ishikawa, Tetsuya ^{[3
]}

Yamauchi, Kazuto ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan

[2] JASRI, Spring 8, Sayo, Hyogo 6795198, Japan

[3] RIKEN, Spring 8, Sayo, Hyogo 6795198, Japan

来源：

SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2 | 2007年 / 879卷

关键词：

nanofocusing; at-wavelength metrology; x-ray mirror; multilayer; and phase error correction;

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We designed, fabricated and evaluated a total-reflection mirror having a designed focal size of 28 mu at 15keV. Line-focus tests on the fabricated mirror were carried out at the 1-km-long beamline (BL29XUL) of SPring-8. Nearly diffraction-limited performance with a full width at half maximum spot size of 30 nm was realized at 15 keV. We are planning to fabricate multilayer-coated mirror for realizing sub-10-nm focusing in hard x-ray region. We suggest a novel method of at-wavelength metrology. Wave-front error on the mirror surface can be estimated by a phase retrieval method using the intensity profile around the focal point. By correcting the estimated wave-front errors, sub-10-nm focusing is potentially feasible.

引用

页码：967 / +

页数：2

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