Fabrication of X-ray mirror for hard X-ray diffraction limited nanofocusing

被引：0

作者：

Yumoto, Hirokatsu ^{[1
]}

Mimura, Hidekazu ^{[1
]}

Matsuyama, Satoshi ^{[1
]}

Handa, Soichiro ^{[1
]}

Shibatani, Akihiko ^{[1
]}

Katagishi, Keiko ^{[1
]}

Yamamura, Kazuya ^{[1
]}

Sano, Yasuhisa ^{[1
]}

Endo, Katsuyoshi ^{[1
]}

Mori, Yuzo ^{[1
]}

Yabashi, Makina ^{[2
]}

Nishino, Yoshinori ^{[3
]}

Tamasaku, Kenji ^{[3
]}

Ishikawa, Tetsuya ^{[3
]}

Yamauchi, Kazuto ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan

[2] JASRI, Spring 8, Sayo, Hyogo 6795198, Japan

[3] RIKEN, Spring 8, Sayo, Hyogo 6795198, Japan

来源：

SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2 | 2007年 / 879卷

关键词：

nanofocusing; at-wavelength metrology; x-ray mirror; multilayer; and phase error correction;

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We designed, fabricated and evaluated a total-reflection mirror having a designed focal size of 28 mu at 15keV. Line-focus tests on the fabricated mirror were carried out at the 1-km-long beamline (BL29XUL) of SPring-8. Nearly diffraction-limited performance with a full width at half maximum spot size of 30 nm was realized at 15 keV. We are planning to fabricate multilayer-coated mirror for realizing sub-10-nm focusing in hard x-ray region. We suggest a novel method of at-wavelength metrology. Wave-front error on the mirror surface can be estimated by a phase retrieval method using the intensity profile around the focal point. By correcting the estimated wave-front errors, sub-10-nm focusing is potentially feasible.

引用

页码：967 / +

页数：2

共 50 条

[1] Nested KB Mirror Fabrication for Synchrotron Hard X-ray Nanofocusing
Shi, Bing
Liu, Wenjun
Qian, Jun
Liu, Chian
Khachatryan, Ruben
Wieczorek, Michael
Khounsary, Ali
Macrander, Albert T.
Zschack, Paul
Tischler, Jonathan Z.
Ice, Gene E.
Assoufid, Lahsen
[J]. ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS VI, 2011, 8139
[2] Hard x-ray wavefront measurement and control for hard x-ray nanofocusing
Handa, Soichiro
Mimura, Hidekazu
Matsuyama, Satoshi
Yumoto, Hirokatsu
Kimura, Takashi
Sano, Yasuhisa
Tamasaku, Kenji
Nishino, Yoshinori
Yabashi, Makina
Ishikawa, Tetsuya
Yamauchi, Kazuto
[J]. ADVANCES IN METROLOGY FOR X-RAY AND EUV OPTICS II, 2007, 6704
[3] Development of piezoelectric deformable mirror for hard X-ray nanofocusing
Matsuyama, S.
Kimura, T.
Nakamori, H.
Imai, S.
Sano, Y.
Kohmura, Y.
Tamasaku, K.
Yabashi, M.
Ishikawa, T.
Yamauchi, K.
[J]. ADAPTIVE X-RAY OPTICS II, 2012, 8503
[4] Fabrication of a precise ellipsoidal mirror for soft X-ray nanofocusing
Mimura, Hidekazu
Takei, Yoshinori
Kume, Takehiro
Takeo, Yoko
Motoyama, Hiroto
Egawa, Satoru
Matsuzawa, Yusuke
Yamaguchi, Gota
Senba, Yasunori
Kishimoto, Hikaru
Ohashi, Haruhiko
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 2018, 89 (09):
[5] Frontier Development of X-ray Diffraction-Limited Nanofocusing
Jiang, Hui
Li, Aiguo
[J]. Guangxue Xuebao/Acta Optica Sinica, 2022, 42 (11):
[6] Frontier Development of X-ray Diffraction-Limited Nanofocusing
Jiang Hui
Li Aiguo
[J]. ACTA OPTICA SINICA, 2022, 42 (11)
[7] Hard X-ray diffraction-limited nanofocusing with Kirkpatrick-Baez mirrors
Mimura, H
Matsuyama, S
Yumoto, H
Hara, H
Yamamura, K
Sano, Y
Shibahara, M
End, K
Mori, Y
Nishino, Y
Tamasaku, K
Yabashi, M
Ishikawa, T
Yamauchi, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2005, 44 (16-19): : L539 - L542
[8] HARD X-RAY MIRROR FABRICATION CAPABILITIES IN EUROPE
SUSINI, J
PAUSCHINGER, D
GEYL, R
FERME, JJ
VIEUX, G
[J]. OPTICAL ENGINEERING, 1995, 34 (02) : 388 - 395
[9] Fabrication of parabolic nanofocusing x-ray lenses
Kurapova, O
Feste, S
Gather, M
Günzler, TF
Hunger, T
Kuhlmann, M
Patommel, J
Schroer, CG
Lengeler, B
van der Hart, A
[J]. DESIGN AND MICROFABRICATION OF NOVEL X-RAY OPTICS II, 2004, 5539 : 38 - 47
[10] Fabrication of an X-Ray Mirror Used in a Soft X-Ray Microscope
Chon, K. S.
Namba, Y.
Yoon, K. H.
[J]. WORLD CONGRESS ON MEDICAL PHYSICS AND BIOMEDICAL ENGINEERING 2006, VOL 14, PTS 1-6, 2007, 14 : 1644 - +

← 1 2 3 4 5 →