Characterization of InGaN quantum dots grown by metalorganic chemical vapor deposition

被引:4
|
作者
Reilly, Caroline E. [1 ]
Bonef, Bastien [1 ]
Nakamura, Shuji [1 ,2 ]
Speck, James S. [1 ]
DenBaars, Steven P. [1 ,2 ]
Keller, Stacia [2 ]
机构
[1] Univ Calif Santa Barbara, Mat Dept, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Elect & Comp Engn Dept, Santa Barbara, CA 93106 USA
基金
美国国家科学基金会;
关键词
nitrides; atom probe tomography; metalorganic chemical vapor deposition; quantum dots; ATOM-PROBE DATA; LOW-THRESHOLD; LASER;
D O I
10.1088/1361-6641/ab4b93
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
InGaN quantum dots were grown by metalorganic chemical vapor deposition and shown to exhibit a bimodal size distribution. Atom probe tomography was used to characterize the dots in conjunction with atomic force microscopy, photoluminescence, and x-ray diffraction. Small dots with low indium contents were found to coexist with larger, very high indium composition dots. Significant compositional fluctuations were observed in the small dot population. The dots showed abrupt interfaces with the surrounding GaN, verifying the ability to cap the dots without causing intermixing for even extremely high indium content dots.
引用
收藏
页数:7
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