Nanopores and Quantum Dots by Selective Area Metalorganic Chemical Vapor Deposition

被引：0
|
作者：
Coleman, J. J. [1 ]
机构：
[1] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
来源：
2012 IEEE PHOTONICS CONFERENCE (IPC) | 2012年
关键词：
LASER;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We describe the metalorganic chemical vapor deposition and patterning by electron beam lithography and selective area growth or wet chemical etching if quantum dots and inverted quantum dot (nanopore) structures suitable for diode lasers.
引用
收藏
页码：776 / 777
页数：2
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