Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation

被引：1

作者：

Masumoto, Hiroshi ^{[1
]}

Goto, Takashi ^{[1
]}

Honda, Yoshitomo ^{[2
]}

Suzuki, Osamu ^{[2
]}

Sasaki, Keiichi ^{[3
]}

机构：

[1] Tohoku Univ, Inst Mat Sci, Sendai, Miyagi, Japan

[2] Tohoku Univ, Grad Sch Dent, Div Craniofacial Funct Engn, Sendai, Miyagi, Japan

[3] Tohoku Univ, Grad Sch Dent, Div Adv Prosthet Dent, Sendai, Miyagi, Japan

来源：

BIOCERAMICS, VOL 19, PTS 1 AND 2 | 2007年 / 330-332卷

基金：

日本学术振兴会;

关键词：

titania films; octacalcium phosphate; electron cyclotron resonance plasma oxidation;

D O I：

10.4028/www.scientific.net/KEM.330-332.565

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300 degrees C and crystallized rutile-type TiO2 films were obtained above 400 degrees C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

引用

页码：565 / +

页数：2

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