Determining thin film density by energy-dispersive x-ray reflectivity: Application to a spin-on-glass dielectric

被引：0
|
作者：
Wallace, WE [1 ]
Wu, WL [1 ]
机构：
[1] NIST,GAITHERSBURG,MD 20899
来源：
SURFACE/INTERFACE AND STRESS EFFECTS IN ELECTRONIC MATERIALS NANOSTRUCTURES | 1996年 / 405卷
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中图分类号：
T [工业技术];
学科分类号：
08 ;
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页码：393 / 398
页数：6
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