Power and area-efficient static current mode logic frequency divider in 180-nm complementary metal-oxide-semiconductor technology

被引:3
|
作者
Maity, Subhanil [1 ]
Jana, Sanjay Kumar [1 ]
Som, Indranil [2 ]
Bhattacharyya, Tarun Kanti [2 ]
机构
[1] Natl Inst Technol Sikkim, Dept Elect & Commun Engn, Ravangla 737139, Sikkim, India
[2] Indian Inst Technol Kharagpur, Dept Elect & Elect Commun Engn, Kharagpur, W Bengal, India
关键词
divide-by-2; divide-by-5; frequency dividers; high speed; low power consumption; MOS current mode logic (MCML); LOCKING-RANGE;
D O I
10.1002/cta.3081
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents power and area optimized, high-speed metal-oxide-semiconductor (MOS) current mode logic (MCML)-based frequency dividers. Each differential pair in the divider is sized separately to minimize the overall power consumption. The divide-by-2 frequency divider has been realized in a 180-nm complementary MOS (CMOS) process technology, and postlayout simulation results show that the proposed frequency divider can work up to an operating frequency of 18.8 GHz in the worst-case process corner with a maximum power dissipation of 1.715 mW under 1.8-V supply. It gives a bandwidth of 19.9 GHz which ranges from 1 to 20.9 GHz. The divider occupies a 0.106 x 0.09 mm(2) area. The performance corresponds to the figure of merit (FoM) of 43.61 dB. The same optimized latches and two EX-OR gates are used to design a divide-by-5 frequency divider that is also realized in 180-nm CMOS process technology. The postlayout simulation results show that the proposed divide-by-5 frequency divider can faithfully work up to an operating frequency of 12.12 GHz in worst-case process corner with an excellent power head performance. The maximum power dissipation of the core circuit is 1.39 mW under 1.8-V supply. It occupies a 0.166 x 0.116 mm(2) area. The performance corresponds to the FoM of 26.56 dB which compares favorably with the state of the art.
引用
收藏
页码:2396 / 2410
页数:15
相关论文
共 50 条
  • [1] Area-efficient ultra-wide-tuning-range ring oscillators in 65-nm complementary metal-oxide-semiconductor
    Yang, Chaowei
    Chen, Yong
    Cheng, Kai
    Stefano, Crovetti Paolo
    Martins, Rui P.
    Mak, Pui-In
    INTERNATIONAL JOURNAL OF CIRCUIT THEORY AND APPLICATIONS, 2024,
  • [2] Design of Low Power Temperature Sensor Based on 180 nm Complementary Metal Oxide Semiconductor Technology
    Liang, Wenbin
    Luo, Zhenzhen
    Yu, Xian
    Chen, Xiaoyan
    JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS, 2023, 18 (05) : 551 - 557
  • [3] Optimization of Stress Memorization Technique for 45 nm Complementary Metal-Oxide-Semiconductor Technology
    Morifuji, Eiji
    Eiho, Ayumi
    Sanuki, Tomoya
    Iwai, Masaaki
    Matsuoka, Fumitomo
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2009, 48 (03) : 031203
  • [4] Design Optimization of a THz Receiver Based on 60 nm Complementary Metal-Oxide-Semiconductor Technology
    Palma, Fabrizio
    Logoteta, Demetrio
    Centurelli, Francesco
    Chevalier, Pascal
    Cicchetti, Renato
    Monsieur, Frederic
    Santini, Carlo
    Testa, Orlandino
    Trifiletti, Alessandro
    d'Alessandro, Antonio
    ELECTRONICS, 2024, 13 (16)
  • [5] Design of On-Chip High Speed Interconnect on Complementary Metal Oxide Semiconductor 180 nm Technology
    Oshita, Takao
    Amakawa, Shuhei
    Ishihara, Noboru
    Masu, Kazuya
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (04)
  • [6] A Fully Differential Operational Transconductance Amplifier Under 40 nm Complementary Metal-Oxide-Semiconductor Logic Process
    Ning, Ning
    Fan, Yang
    Sui, Zhiling
    Cao, Yingshuai
    Wu, Shuangyi
    Yu, Qi
    NANOSCIENCE AND NANOTECHNOLOGY LETTERS, 2012, 4 (08) : 849 - 853
  • [7] A power amplifier with bandwidth expansion and linearity enhancement in 130 nm complementary metal-oxide-semiconductor process
    Cao, Cheng
    Liu, Jiangfan
    Li, Yubing
    Tan, Tao
    Huang, Zemeng
    Zhang, Ping
    Li, Qingwen
    Qi, Zihang
    Li, Xiuping
    INTERNATIONAL JOURNAL OF RF AND MICROWAVE COMPUTER-AIDED ENGINEERING, 2021, 31 (06)
  • [8] Experimental Analysis of Within-Die Process Variation in 65 and 180 nm Complementary Metal-Oxide-Semiconductor Technology Including Its Distance Dependences
    Ansari, Tania
    Imafuku, Wataru
    Yasuda, Masahiro
    Mattausch, Hans Juergen
    Koide, Tetsushi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (04)
  • [9] Pulsed radio frequency characterisation on 28 nm complementary metal-oxide semiconductor technology
    Sahoo, A. K.
    Fregonese, S.
    Scheer, P.
    Celi, D.
    Juge, A.
    Zimmer, T.
    ELECTRONICS LETTERS, 2015, 51 (01) : 71 - U8978
  • [10] Design of 5.8 GHz Integrated Antenna on 180nm Complementary Metal Oxide Semiconductor (CMOS) Technology
    Razak, A. H. A.
    Shamsuddin, M. I. A.
    Idros, M. F. M.
    Halim, A. K.
    Ahmad, A.
    Al Junid, S. A. M.
    INTERNATIONAL CONFERENCE ON APPLIED ELECTRONIC AND ENGINEERING 2017 (ICAEE2017), 2018, 341