A comparison of ArF and KrF laser performance at 2kHz for microlithography

被引：0

作者：

Besaucele, H ^{[1
]}

Das, P ^{[1
]}

Duffey, T ^{[1
]}

Embree, T ^{[1
]}

Ershov, A ^{[1
]}

Fleurov, V ^{[1
]}

Grove, S ^{[1
]}

Melcher, P ^{[1
]}

Ness, R ^{[1
]}

Padmadandu, GG ^{[1
]}

机构：

[1] Cymer Inc, San Diego, CA 92127 USA

来源：

OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2 | 2000年 / 4000卷

关键词：

ArF laser; KrF laser; 193nm microlithography; 248nm microlithography; Exposure Sensor Feedback;

D O I：

10.1117/12.388986

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Exposure tools for 193nm lithography are expected lo use Argon-Fluoride lasers at repetition rates of at least 2kHz. We are showing that, by revisiting several key technologies, the performance and reliability of ArF lasers at 2 kHz are trending towards a lever comparable to KrF lasers.

引用

页码：1476 / 1480

页数：5

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