A comparison of ArF and KrF laser performance at 2kHz for microlithography

被引：0
|
作者：
Besaucele, H [1 ]
Das, P [1 ]
Duffey, T [1 ]
Embree, T [1 ]
Ershov, A [1 ]
Fleurov, V [1 ]
Grove, S [1 ]
Melcher, P [1 ]
Ness, R [1 ]
Padmadandu, GG [1 ]
机构：
[1] Cymer Inc, San Diego, CA 92127 USA
来源：
OPTICAL MICROLITHOGRAPHY XIII, PTS 1 AND 2 | 2000年 / 4000卷
关键词：
ArF laser; KrF laser; 193nm microlithography; 248nm microlithography; Exposure Sensor Feedback;
D O I：
10.1117/12.388986
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Exposure tools for 193nm lithography are expected lo use Argon-Fluoride lasers at repetition rates of at least 2kHz. We are showing that, by revisiting several key technologies, the performance and reliability of ArF lasers at 2 kHz are trending towards a lever comparable to KrF lasers.
引用
收藏
页码：1476 / 1480
页数：5
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