Materials selection for thin films for radio frequency microelectromechanical systems

被引：6
|
作者：
Guisbiers, G. [1 ]
Van Overschelde, O. [1 ]
Wautelet, M. [1 ]
机构：
[1] Univ Mons, B-7000 Mons, Belgium
来源：
MATERIALS & DESIGN | 2007年 / 28卷 / 06期
关键词：
D O I：
10.1016/j.matdes.2006.04.006
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Materials selection is an important subject in microtechnology. The methodology developed by Ashby is used here. It is shown that it can be applied easily to microelectromechanical systems (MEMS). Firstly, a. selection concerning a minimization of intrinsic residual stresses for thin films deposited by evaporation process is presented. Secondly, the selection of materials to serve in the design of the bridge of a MEMS-RF switch and a MEMS-RF varicap (variable capacitor) is considered. (C) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码：1994 / 1997
页数：4
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