Single-domain epitaxial silicene on diboride thin films

被引:14
|
作者
Fleurence, A. [1 ]
Gill, T. G. [1 ,2 ,3 ]
Friedlein, R. [1 ,7 ]
Sadowski, J. T. [5 ]
Aoyagi, K. [1 ]
Copel, M. [6 ]
Tromp, R. M. [6 ]
Hirjibehedin, C. F. [2 ,3 ,4 ]
Yamada-Takamura, Y. [1 ]
机构
[1] JAIST, Sch Mat Sci, 1-1 Asahidai, Nomi, Ishikawa 9231292, Japan
[2] UCL, London Ctr Nanotechnol, London WC1H 0AH, England
[3] UCL, Dept Chem, London WC1H 0AJ, England
[4] UCL, Dept Phys & Astron, Mortimer St, London WC1E 6BT, England
[5] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[6] IBM Corp, Div Res, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
[7] Meyer Burger Germany AG, BU MicroSyst, D-09337 Hohenstein Ernstt, Germany
基金
英国工程与自然科学研究理事会;
关键词
Electronic properties;
D O I
10.1063/1.4945370
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial silicene, which forms spontaneously on ZrB2(0001) thin films grown on Si(111) wafers, has a periodic stripe domain structure. By adsorbing additional Si atoms on this surface, we find that the domain boundaries vanish, and a single-domain silicene sheet can be prepared without altering its buckled honeycomb structure. The amount of Si required to induce this change suggests that the domain boundaries are made of a local distortion of the silicene honeycomb lattice. The realization of a single domain sheet with structural and electronic properties close to those of the original striped state demonstrates the high structural flexibility of silicene. (C) 2016 AIP Publishing LLC.
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页数:5
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