Single-domain epitaxial silicene on diboride thin films

被引:14
|
作者
Fleurence, A. [1 ]
Gill, T. G. [1 ,2 ,3 ]
Friedlein, R. [1 ,7 ]
Sadowski, J. T. [5 ]
Aoyagi, K. [1 ]
Copel, M. [6 ]
Tromp, R. M. [6 ]
Hirjibehedin, C. F. [2 ,3 ,4 ]
Yamada-Takamura, Y. [1 ]
机构
[1] JAIST, Sch Mat Sci, 1-1 Asahidai, Nomi, Ishikawa 9231292, Japan
[2] UCL, London Ctr Nanotechnol, London WC1H 0AH, England
[3] UCL, Dept Chem, London WC1H 0AJ, England
[4] UCL, Dept Phys & Astron, Mortimer St, London WC1E 6BT, England
[5] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[6] IBM Corp, Div Res, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
[7] Meyer Burger Germany AG, BU MicroSyst, D-09337 Hohenstein Ernstt, Germany
基金
英国工程与自然科学研究理事会;
关键词
Electronic properties;
D O I
10.1063/1.4945370
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial silicene, which forms spontaneously on ZrB2(0001) thin films grown on Si(111) wafers, has a periodic stripe domain structure. By adsorbing additional Si atoms on this surface, we find that the domain boundaries vanish, and a single-domain silicene sheet can be prepared without altering its buckled honeycomb structure. The amount of Si required to induce this change suggests that the domain boundaries are made of a local distortion of the silicene honeycomb lattice. The realization of a single domain sheet with structural and electronic properties close to those of the original striped state demonstrates the high structural flexibility of silicene. (C) 2016 AIP Publishing LLC.
引用
收藏
页数:5
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