Reliability properties of low-voltage ferroelectric capacitors and memory arrays

被引:92
|
作者
Rodriguez, JA [1 ]
Remack, K
Boku, K
Udayakumar, KR
Aggarwal, S
Summerfelt, SR
Celii, FG
Martin, S
Hall, L
Taylor, K
Moise, T
McAdams, H
McPherson, J
Bailey, R
Fox, G
Depner, M
机构
[1] Texas Instruments Inc, Dallas, TX 75243 USA
[2] Ramtron Int Corp, Colorado Springs, CO 80921 USA
关键词
Bit distribution; fatigue; ferroelectric memory; FRAM; I-V; imprint; polarization; PZT; retention;
D O I
10.1109/TDMR.2004.837210
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the reliability properties of ferroelectric capacitors and memory arrays embedded in a 130-mn CMOS logic process with 5LM Cu/FSG. Low voltage (<1.5 V) operation is enabled by the 70-mn thick MOCVD PZT rerroelectric films. Data loss resulting from high temperature bakes is primarily caused by the imprint effect, which shows similar to1.5 eV time-to-fail activation energy. Excellent bit endurance properties are observed on fully packaged memory arrays, with no degradation up to 10(13) write/read polarization switching cycles. Retention measured after 10(12) switching cycles demonstrates no degradation relative to arrays with minimal cycling.
引用
收藏
页码:436 / 449
页数:14
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