Breakdown enhancement in silicon nanowire p-n junctions

被引:23
|
作者
Agarwal, P. [1 ]
Vijayaraghavan, M. N. [1 ]
Neuilly, F. [1 ]
Hijzen, E. [1 ]
Hurkx, G. A. M. [1 ]
机构
[1] NXP Semicond, B-3001 Louvain, Belgium
关键词
D O I
10.1021/nl062681n
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We demonstrate highly reproducible silicon nanowire diodes fabricated with a fully VLSI compatible etching technology, with diameters down to 30 nm. A contact technology based on recrystallized polysilicon enables specific contact resistances as low as rho approximate to 10(-7) Omega cm(2). Our devices show a strongly diameter-dependent breakdown voltage at reverse bias, which we explain in terms of the influence of the surrounding dielectric. We suggest that this technology is suitable for incorporating nanowire-based functionalities into future integrated circuits.
引用
收藏
页码:896 / 899
页数:4
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