Deposition of CNx films in inductively coupled RF discharge

被引：0
|
作者：
Zajícková, L [1 ]
Eliás, M [1 ]
Bursíková, V [1 ]
Janca, J [1 ]
Lorentz, M [1 ]
机构：
[1] Masaryk Univ, Dept Phys Elect, CS-61137 Brno, Czech Republic
来源：
INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS | 1999年
关键词：
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
引用
收藏
页码：41 / 42
页数：2
相关论文
共 50 条
  • [1] Characterization of CNx/SiOy films prepared by the inductively coupled RF discharge
    Eliás, M
    Zajícková, L
    Bursíková, V
    Janca, J
    [J]. CZECHOSLOVAK JOURNAL OF PHYSICS, 2000, 50 : 453 - 456
  • [2] Deposition of nanocomposite CNx/SiO2 films in inductively coupled r.f. discharge
    Eliás, M
    Zajícková, L
    Bursíková, V
    Janca, J
    Lorenc, M
    [J]. DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 552 - 555
  • [3] Hydrophobic CNx thin film growth by inductively-coupled RF plasma enhanced pulsed laser deposition
    Ramsey, ME
    Poindexter, E
    Pelt, JS
    Marin, J
    Durbin, SM
    [J]. THIN SOLID FILMS, 2000, 360 (1-2) : 82 - 88
  • [4] Preparation of nitrogen-rich CNx films with inductively coupled plasma CVD and pulsed laser deposition
    Bulir, J
    Delplancke-Ogletree, MP
    Lancok, J
    Jelínek, M
    Popov, C
    Klett, A
    Kulisch, W
    [J]. DIAMOND AND RELATED MATERIALS, 2001, 10 (9-10) : 1901 - 1909
  • [5] Spectral diagnostics of inductively coupled RF discharge plasma
    I. Sh. Abdullin
    A. N. Bykanov
    I. G. Gafarov
    O. E. Ibragimov
    R. F. Sharafeev
    [J]. High Energy Chemistry, 2012, 46 : 271 - 275
  • [6] Spectral diagnostics of inductively coupled RF discharge plasma
    Abdullin, I. Sh
    Bykanov, A. N.
    Gafarov, I. G.
    Ibragimov, O. E.
    Sharafeev, R. F.
    [J]. HIGH ENERGY CHEMISTRY, 2012, 46 (04) : 271 - 275
  • [7] RF and DC plasma assisted laser deposition of a-CNx thin films
    Tomov, RI
    Jelinek, M
    Bulir, J
    [J]. TENTH INTERNATIONAL SCHOOL ON QUANTUM ELECTRONICS: LASER PHYSICS AND APPLICATIONS, 1999, 3571 : 344 - 348
  • [8] Inductively coupled plasma-assisted RF magnetron sputtering deposition of highly uniform SiC nanoislanded films
    Cheng, Qijin
    Xu, S.
    Huang, Shiyong
    Long, Jidong
    Ren, Yuping
    Xu, Ming
    Ostrikov, Kostya
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 2008, 36 (04) : 870 - 871
  • [9] Deposition of polymer films by rf discharge at atmospheric pressure
    Slavícek, P
    Bursíková, V
    Brablec, A
    Kapicka, V
    Klíma, M
    [J]. CZECHOSLOVAK JOURNAL OF PHYSICS, 2004, 54 : C586 - C591
  • [10] Investigation of the Discharge Chamber Expansion Region Influence on the Electron Density in an Inductively Coupled RF Discharge
    A. Y. Shemakhin
    V. S. Zheltukhin
    G. B. Kiselev
    T. N. Terentev
    [J]. High Energy Chemistry, 2023, 57 : S227 - S233
12345