Deposition of CNx films in inductively coupled RF discharge

被引：0
|
作者：
Zajícková, L [1 ]
Eliás, M [1 ]
Bursíková, V [1 ]
Janca, J [1 ]
Lorentz, M [1 ]
机构：
[1] Masaryk Univ, Dept Phys Elect, CS-61137 Brno, Czech Republic
来源：
INTERNATIONAL CONFERENCE ON PHENOMENA IN IONIZED GAS, VOL I, PROCEEDINGS | 1999年
关键词：
D O I：
暂无
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
引用
收藏
页码：41 / 42
页数：2
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