Magnetic nanostructures fabricated by the atomic force microscopy nano-lithography technique

被引:19
|
作者
Watanabe, K [1 ]
Takemura, Y
Shimazu, Y
Shirakashi, J
机构
[1] Yokohama Natl Univ, Yokohama, Kanagawa 2408501, Japan
[2] Akita Prefectural Univ, Akita 0150055, Japan
关键词
D O I
10.1088/0957-4484/15/10/012
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A local oxidation technique using atomic force microscopy (AFM) was performed in order to modify magnetic domain structures in ferromagnetic nanostructures. Co-based nanostructures with a rectangular shape were fabricated by using electron beam lithography followed by AFM nano-oxidation. After fabricating a Co-oxide nanowire across a Co nanodot by AFM nano-oxidation, a domain structure of the dot observed before the nano-oxidation was divided into two parts of the domain. AFM nano-oxidation for a higher aspect ratio of height/width of the fabricated nanostructures was also investigated. By applying a do bias between an Al2O3/Ni double layer film and the AFM tip, the Ni layer was locally oxidized through the capped Al2O3 insulating layer. The nanowires of oxide obtained on the Al2O3/Ni double layer film were thicker and had a higher aspect ratio of height/width than those obtained on a Ni single layer film.
引用
收藏
页码:S566 / S569
页数:4
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