The Characteristic of GZO Thin Film Deposited on Flexible Substrates by Using RF Magnetron Sputtering

被引：0
|
作者：
Chen, TaoHsing [1 ]
Chiang, Chia-Ching [1 ]
Chen, Ting-You [1 ]
机构：
[1] Natl Kaohsiung Univ Appl Sci, Dept Mech Engn, Kaohsiung 807, Taiwan
来源：
2014 21ST INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD) | 2014年
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this study, we investigate the optical and electrical properties of ZnO:Ga (GZO) films on polyimide flexible substrates by using radio frequency magnetron sputtering(RF-sputtering). The structural, electric and optical characteristics of GZO thin films with various deposition parameters were investigated. All films illustrate strong (002) for GZO preferential orientation by using XRD analysis. The results show that the optical transmittance of GZO thin film exhibited an excellent transparency in the visible light field. Moreover, the resistivity of GZO decrease with increasing deposited time,
引用
收藏
页码：199 / 202
页数：4
相关论文
共 50 条
  • [41] Morphology of lithium niobium oxide thin film ultrasonic transducers deposited by RF magnetron sputtering
    Zeng, Xiaomei
    Pelenovich, Vasiliy
    Xu, Chang
    Neena, D.
    Jiang, Yanghui
    Zhang, Xiangyu
    Pogrebnjak, Alexander
    Rakhimov, Rakhim
    Zhang, Jun
    Yang, Bing
    Liu, Sheng
    CERAMICS INTERNATIONAL, 2023, 49 (10) : 16297 - 16304
  • [42] Fe dopants enhancing ethanol sensitivity of ZnO thin film deposited by RF magnetron sputtering
    M. Mehedi Hassan
    Wasi Khan
    A. H. Naqvi
    Prabhash Mishra
    S. S. Islam
    Journal of Materials Science, 2014, 49 : 6248 - 6256
  • [43] Study on mixed vanadium oxide thin film deposited by RF magnetron sputtering and its application
    Zhang Ling
    Tu Jianhui
    Feng Hao
    Cui Jingzhong
    PROCEEDING OF THE FOURTH INTERNATIONAL CONFERENCE ON SURFACE AND INTERFACE SCIENCE AND ENGINEERING, 2011, 18
  • [44] Fe dopants enhancing ethanol sensitivity of ZnO thin film deposited by RF magnetron sputtering
    Hassan, M. Mehedi
    Khan, Wasi
    Naqvi, A. H.
    Mishra, Prabhash
    Islam, S. S.
    JOURNAL OF MATERIALS SCIENCE, 2014, 49 (18) : 6248 - 6256
  • [45] Physical Characteristic of Room-Temperature Deposited Ti Thin Films by RF Magnetron Sputtering at Different RF Power
    Aznilinda, Z.
    Herman, S. H.
    Bakar, R. A.
    Rusop, M.
    2012 10TH IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS (ICSE), 2012, : 328 - 332
  • [46] AlN thin films deposited on different Si-based substrates through RF magnetron sputtering
    Xiangquan Jiao
    Yu Shi
    Hui Zhong
    Rui Zhang
    Jie Yang
    Journal of Materials Science: Materials in Electronics, 2015, 26 : 801 - 808
  • [47] Properties of TiO2 thin films deposited by rf reactive magnetron sputtering on biased substrates
    Nezar, Sawsen
    Saoula, Nadia
    Sali, Samira
    Faiz, Mohammed
    Mekki, Mogtaba
    Laoufi, Nadia Aicha
    Tabet, Nouar
    APPLIED SURFACE SCIENCE, 2017, 395 : 172 - 179
  • [48] Growth of ZnO thin film on SiO2 substrates by the RF magnetron sputtering method
    Kim, KS
    Kim, HW
    Kim, NH
    JOURNAL OF MATERIALS SCIENCE LETTERS, 2003, 22 (16) : 1155 - 1156
  • [49] AlN thin films deposited on different Si-based substrates through RF magnetron sputtering
    Jiao, Xiangquan
    Shi, Yu
    Zhong, Hui
    Zhang, Rui
    Yang, Jie
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2015, 26 (02) : 801 - 808
  • [50] Flexible Amorphous Hybrid Barrier Films Deposited by RF Magnetron Sputtering
    Liang, Chih-Hao
    Chau, Joseph Lik Hang
    Pan, Alfred I-Tsung
    Yang, Chih-Chao
    Shih, Hsi-Hsin
    SCIENCE OF ADVANCED MATERIALS, 2015, 7 (03) : 504 - 508
12345