共 50 条
- [1] Post-lithography characterization of ArF resists for 45 nm node implant layers and beyond ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PTS 1 AND 2, 2008, 6923
- [2] RET masks for patterning 45nm node contact hole using ArF immersion lithography PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2, 2006, 6283
- [3] RET application in 45nm node and 32nm node contact hole dry ArF lithography process development OPTICAL MICROLITHOGRAPHY XX, PTS 1-3, 2007, 6520
- [4] Water immersion optical lithography for the 45nm node OPTICAL MICROLITHOGRAPHY XVI, PTS 1-3, 2003, 5040 : 679 - 689
- [5] The Defectivity Reduction on Hole Layers beyond 45nm Node CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE 2012 (CSTIC 2012), 2012, 44 (01): : 291 - 296
- [6] Enabling the 45nm node by hyper-NA polarized lithography OPTICAL MICROLITHOGRAPHY XIX, PTS 1-3, 2006, 6154 : U209 - U219
- [7] Feasibility study of double exposure lithography for 65nm & 45nm node Photomask and Next-Generation Lithography Mask Technology XII, Pts 1 and 2, 2005, 5853 : 252 - 264
- [9] E-beam lithography experimental results and simulation for the 45nm node 24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2, 2004, 5567 : 565 - 574
- [10] Dark field double dipole lithography (DDL) for 45nm node and beyond PHOTOMASK AND NEXT GENERATION LITHOGRAPHY MASK TECHNOLOGY XIII, PTS 1 AND 2, 2006, 6283