Patterned growth of aligned ZnO nanowire arrays on sapphire and GaN layers

被引:78
|
作者
Fan, HJ
Fleischer, F
Lee, W
Nielsch, K
Scholz, R
Zacharias, M
Gösele, U
Dadgar, A
Krost, A
机构
[1] Max Planck Inst Microstruct Phys, D-06120 Halle An Der Saale, Germany
[2] Otto Von Guericke Univ, Inst Expt Phys, D-39016 Magdeburg, Germany
关键词
zinc oxide; semiconductor nanowire; nanopatterning; epitaxial growth;
D O I
10.1016/j.spmi.2004.08.028
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Patterned growth of vertically aligned ZnO nanowire arrays on the micrometer and nanometer scale on sapphire and GaN epilayers is reported. In order to control the position and distribution density of the ZnO nanowires, Au seeding nanodots are defined, as regular arrays, with the assistance of deposition shadow masks. Electron micrographs reveal that the wires are single crystals having wire axes along the hexagonal c-axes. The epitaxial growth of ZnO nanowires on sapphire and GaN films on Si substrates was further verified by cross sectional electron microscopy investigations. Compared to the sapphire case, the perfect epitaxial growth on a GaN film on a Si substrate is believed to be more suitable for potential electronic device applications of ZnO nanowire arrays. (C) 2004 Published by Elsevier Ltd.
引用
收藏
页码:95 / 105
页数:11
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