Strain of M-plane GaN epitaxial layer grown on β-LiGaO2 (100) by plasma-assisted molecular beam epitaxy

被引:1
|
作者
You, Shuo-Ting [1 ]
Lo, Ikai [1 ]
Shih, Huei-Jyun [1 ]
Hang, Hui-Chun [2 ]
Chou, Mitch M. C. [2 ]
机构
[1] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Dept Phys, Kaohsiung 80424, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Mat & Optoelect Sci, Kaohsiung 80424, Taiwan
来源
AIP ADVANCES | 2018年 / 8卷 / 07期
关键词
LIGHT-EMITTING-DIODES; NITRIDE; SEMICONDUCTORS; POLARIZATION; SUBSTRATE; CRYSTAL; LIGAO2;
D O I
10.1063/1.5037006
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have grown a high-quality single-phase M-plane GaN on beta-LiGaO2 (100) by plasma-assisted molecular beam epitaxy. The Hooke's law for M-plane GaN was derived by a stress tenor transformation. From the analysis of M-plane GaN microstructure, the lattice strain of M-plane GaN along the [11 (2) over bar0] and [0001] directions have been estimated. Based on the Hooke's law, we calculated the ratio of anisotropic stress which was consistent with the ratio of thermal expansion-mismatch between GaN and LiGaO2 (100). We demonstrated that the thermal expansion mismatch was the major factor to degrade the quality of M-plane GaN on beta-LiGaO2 (100). (c) 2018 Author(s).
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页数:8
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