Growth effects in carbon coatings deposited by magnetron sputtering

被引:27
|
作者
Vetter, J
Stüber, M
Ulrich, S
机构
[1] Metaplas Ionon GmbH, D-51427 Bergisch Gladbach, Germany
[2] Forschungszentrum Karlsruhe, Inst Mat Forsch, D-76021 Karlsruhe, Germany
来源
SURFACE & COATINGS TECHNOLOGY | 2003年 / 168卷 / 2-3期
关键词
amorphous carbon; sputtering; growth defects; wear; friction;
D O I
10.1016/S0257-8972(03)00010-0
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Hard amorphous carbon (a-C) coatings were deposited by DC magnetron sputtering from graphite targets by applying different growth conditions. Depending on the process parameters special growth effects and morphologies were observed and analysed by scanning electron microscopy. The constitution and selected properties of the coatings were characterised by Raman spectroscopy, and by measurements of the Vickers hardness and the critical load of failure in the scratch test. A method for the high-rate deposition of hard a-C coatings (Vickers hardness up to 1400 HV0.05, deposition rate up to 1 mum/h, thickness up to 5 mum) with a very low defect density, and dominated mainly by sp(2)-bondings, is presented. The properties and the morphology of the coatings are discussed with respect to the applied growth conditions. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:169 / 178
页数:10
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