Deposition of highly c-axis-oriented ScAlN thin films by RF magnetron sputtering using a Sc-Al alloy target

被引：0
|
作者：
Fujii, S. [1 ]
Shimizu, S. [3 ]
Sumisaka, M. [3 ]
Suzuki, Y. [2 ]
Otomo, S. [2 ]
Omori, T. [3 ]
Hashimoto, K. [3 ]
机构：
[1] Chiba Univ, Org Acad Ind Collaborat & Intellectual Property, Chiba, Japan
[2] Furuya Met Co Ltd, R&D Dept, Ibaraki, Japan
[3] Chiba Univ, Grad Sch Engn, Chiba, Japan
来源：
2014 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM (FCS) | 2014年
基金：
日本学术振兴会;
关键词：
RF magnetron sputtering; ScAlN; SAW resonator;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
High-Sc-content ScAlN thin films have attracted significant attention because of their strong piezoelectricity. Instead of a co-sputtering system, a conventional RF-magnetron sputtering system was employed using a Sc-Al alloy metal target for deposition of ScAlN thin films. Highly c-axis-oriented ScAlN thin films with a Sc concentration of 32 at.% were obtained. We also demonstrate that a one-port surface acoustic wave (SAW) resonator based on the ScAlN/Si structure has a K-2 value of 1.7% at 2 GHz, which is four times larger than that of the AlN/Si structure.
引用
收藏
页码：344 / 347
页数：4
相关论文
共 50 条
  • [1] Highly c-axis-oriented ScAlN thin films deposited using Sc-Al alloy target
    Fujii, Satoshi
    Sumisaka, Masahiro
    Tang, Gonbin
    Suzuki, Yu
    Otomo, Shohei
    Omori, Tatsuya
    Hashimoto, Ken-ya
    2015 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM (IMS), 2015,
  • [2] Deposition of highly c-axis-oriented ScAlN thin films at different sputtering power
    Tang, Jialin
    Niu, Dongwei
    Tai, Zhiwei
    Hu, Xianwei
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2017, 28 (07) : 5512 - 5517
  • [3] Deposition of highly c-axis-oriented ScAlN thin films at different sputtering power
    Jialin Tang
    Dongwei Niu
    Zhiwei Tai
    Xianwei Hu
    Journal of Materials Science: Materials in Electronics, 2017, 28 : 5512 - 5517
  • [4] Microstructural evolution and formation of highly c-axis-oriented aluminum nitride films by reactively magnetron sputtering deposition
    Liu, WJ
    Wu, SJ
    Chen, CM
    Lai, YC
    Chuang, CH
    JOURNAL OF CRYSTAL GROWTH, 2005, 276 (3-4) : 525 - 533
  • [5] Synthesis of c-axis-oriented aluminum nitride films by reactive RF magnetron sputtering for surface acoustic wave
    Kao, KS
    Cheng, CC
    Chen, YC
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (08): : 4969 - 4973
  • [6] Highly c-axis-oriented apatite-type lanthanum silicate thin films fabricated by magnetron sputtering under bias
    Hidaka, Shigekazu
    Takagi, Kenji
    Yamamoto, Takahisa
    MATERIALS CHEMISTRY AND PHYSICS, 2024, 326
  • [7] Sputtering highly c-axis-oriented AlN films on langasite substrate
    Wu, Sean
    Lee, Maw-Shung
    Ro, Ruyen
    Tsai, J. K.
    Hwu, Dyi-Hwa
    2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2, 2007, : 149 - +
  • [8] High-quality c-axis oriented Al(Sc)N thin films prepared by magnetron sputtering
    Wang, Mei
    Bo, Huating
    Wang, Aobo
    Cheng, Zhengwang
    Li, Shengjia
    Zou, Wei
    He, Jing
    Ma, Xinguo
    THIN SOLID FILMS, 2023, 781
  • [9] Preferred C-axis Oriented Photoluminescent ZnO Thin Films Prepared by RF Magnetron Sputtering
    Mondal, Praloy
    Das, Debajyoti
    SOLID STATE PHYSICS, VOL 57, 2013, 1512 : 644 - 645
  • [10] Low-bandgap, highly c-axis-oriented Al-doped ZnO thin films
    Wen, Long
    Kumar, Manish
    Cho, Hyung Jun
    Leksakul, Komgrit
    Han, Jeon Geon
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, 50 (18)
12345