The ambient temperature effect on current-voltage characteristics of surface-passivated GaN-nased field-effect transistors

被引:0
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作者
Liu, WL [1 ]
Turin, VO
Balandin, AA
Chen, YL
Wang, KL
机构
[1] Univ Calif Riverside, Dept Elect Engn, Nanodevice Lab, Riverside, CA 92521 USA
[2] Univ Calif Los Angeles, Dept Elect Engn, Device Res Lab, Los Angeles, CA 90024 USA
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T [工业技术];
学科分类号
08 ;
摘要
We have studied experimentally the effect of ambient temperature on performance of the surface-passivated Al0.2Ga0.8N/GaN heterostructure field-effect transistors in the temperature range from 25 degreesC to 250 degreesC. The measured data have been compared with physics-based modeling of the GaN transistor characteristics under different ambient temperatures. The experimental data, showing about 33% degradation in the saturation current with a temperature increase from 25 degreesC to 250 degreesC, agrees well with the results of simulations performed using ISE DESSIS software. Obtained results and analytical extrapolations can be used for predicting device performance in changing environments, as well as for optimization of the device structure.
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