共 50 条
- [41] Dependence of time-dependent dielectric breakdown lifetime on NH3-plasma treatment in Cu interconnects JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (7A): : 4859 - 4862
- [43] On the oxide thickness dependence of the time-dependent-dielectric-breakdown 1999 IEEE HONG KONG ELECTRON DEVICES MEETING, PROCEEDINGS, 1999, : 42 - 45
- [44] Modeling of interconnect dielectric lifetime under stress conditions and new extrapolation methodologies for time-dependent dielectric breakdown 2007 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM PROCEEDINGS - 45TH ANNUAL, 2007, : 390 - +
- [45] Accurate Model for Time-Dependent Dielectric Breakdown of High-K Metal Gate Stacks 2009 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, VOLS 1 AND 2, 2009, : 523 - +
- [47] A new physics-based model for time-dependent-dielectric-breakdown 1995 INTERNATIONAL INTEGRATED RELIABILITY WORKSHOP, FINAL REPORT, 1996, : 72 - 80
- [48] A new physics-based model for time-dependent-dielectric-breakdown 1996 IEEE INTERNATIONAL RELIABILITY PHYSICS PROCEEDINGS, 34TH ANNUAL, 1996, : 84 - 92
- [50] Extrinsic time-dependent dielectric breakdown of low-k organosilicate thin films from vacuum-ultraviolet irradiation JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2017, 35 (02):