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All nitride magnetic tunnel junctions based on nitrogen-doped CoFe electrode and AlNx insulating barrier
被引:2
|作者:
Kim, Ki Woong
[1
]
Lee, Ja Bin
[1
]
Shin, Il Jae
[1
]
Koo, Ja Hyun
[1
]
Hong, Jin Pyo
[1
]
机构:
[1] Hanyang Univ, Novel Funct Mat & Devices Lab, Dept Phys, Seoul 133791, South Korea
关键词:
ROOM-TEMPERATURE;
GRAIN-SIZE;
MAGNETORESISTANCE;
FE;
COERCIVITY;
D O I:
10.1063/1.3391776
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The dependence of the structural and magnetic properties of nitrogen-doped CoFe (CoFeN) films as a function of the nitrogen gas flow rate was analyzed to investigate its potential use as ferromagnetic electrodes in magnetic tunnel junctions (MTJs). The addition of a small amount of nitrogen into the CoFe film was strongly associated with the formation of low coercivity and low magnetization in the CoFeN film. We also discuss the electrical and microstructural properties of the as-grown and postannealed CoFeN/AlN/CoFeN MTJs devices developed by using only nitride materials of CoFeN electrodes and AlNx tunneling barriers. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3391776]
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页数:4
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