Integrated measurement of micro motions for MEMS dynamic performance analysis

A fully integrated optical and electrical measurement system made of off-the-shelf optical components and electrical instruments that characterizes the micro motions for MEMS dynamic performance at the wafer/die level automatically is presented. Both periodic and non-periodic in-plane micro motions could be measured by the blur-synthesis method based on the machine vision technology. The periodic out-of-plane micro motions could be estimated by the laser stroboscopic phase-shifting interferometry with the digital image processing technology. Some improved algorithms together with the sub pixel method and 2D waveform transform technology are bought forward and experimented for the measurement of micro motions with higher resolution. The methods could measure micro motions up to tens of KHz in real time with nano resolution and the characterization is both in situ and nondestructive. Based upon the virtual instrument technology, the measurement system with friendly user interfaces, open hardware and software architectures and expansible features could be used practically in MEMS R&D field and more improvements to this system could be made continually.