Improved compact model for double-gate tunnel field-effect transistors by the rigorous consideration of gate fringing field

被引:13
|
作者
Kim, Sangwan [1 ]
Choi, Woo Young [2 ]
机构
[1] Ajou Univ, Dept Elect & Comp Engn, Suwon 16499, South Korea
[2] Sogang Univ, Dept Elect Engn, Seoul 04107, South Korea
基金
新加坡国家研究基金会;
关键词
CAPACITANCE;
D O I
10.7567/JJAP.56.084301
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, the accuracy of a compact current-voltage (I-V) model for double-gate n-channel tunnel field-effect transistors (TFETs) is improve by considering outer and inner gate fringing field effects. The refined model is benchmarked against technology computer-aided design (TCAD) device simulations and compared against a previously published compact model. The normalized root-mean-square error for current in the linear region of operation (i.e., for 0.05V drain voltage) is reduced from similar to 593 to similar to 5%. (C) 2017 The Japan Society of Applied Physics
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页数:5
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