Gas cluster ion beam applications and equipment

被引:48
|
作者
Kirkpatrick, A [1 ]
机构
[1] Epion Corp, Billerica, MA 01821 USA
关键词
gas; cluster; ion; GCIB; applications; equipment;
D O I
10.1016/S0168-583X(03)00858-9
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Interactions of gas cluster ions with solid surfaces, and prospective applications for those interactions, have been research topics of interest for several years. Substantial development efforts have been directed towards the problems associated with generating and transporting cluster ion beams having intensities sufficient to allow utilization in practical processing equipment. Unique smoothing, etching and chemical transformation effects which can be produced by cluster ion beams have been applied to a broad range of materials. Original gas cluster ion beam (GCIB) equipment which provided nanoampere level beam currents has evolved into automated milliampere level machines offering excellent process throughput, uniformity and reproducibility over large area targets. This paper will review cluster ion interactions, example applications and the present status of commercial GCIB processing equipment. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:830 / 837
页数:8
相关论文
共 50 条
  • [21] Recent developments in gas cluster ion beam technology
    Toyoda N.
    Toyoda, Noriaki (ntoyoda@incub.u-hyogo.ac.jp), 1600, Vacuum Society of Japan (59): : 121 - 127
  • [22] Smoothing of ZnO films by gas cluster ion beam
    Chen, H
    Liu, SW
    Wang, XM
    Iliev, MN
    Chen, CL
    Yu, XK
    Liu, JR
    Ma, K
    Chu, WK
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2005, 241 (1-4): : 630 - 635
  • [23] Gas cluster ion beam processing for si photonics
    Toyoda, N.
    Yamada, I.
    Akiyama, S.
    Kimerling, L. C.
    Ishikawa, Y.
    Wada, K.
    2007 4TH IEEE INTERNATIONAL CONFERENCE ON GROUP IV PHOTONICS, 2007, : 58 - +
  • [24] Applications of gas cluster ion beams for materials processing
    Yamada, I
    MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1996, 217 : 82 - 88
  • [25] Applications of gas cluster ion beams for materials processing
    Yamada, I
    IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA, 1996, 60 (09): : 109 - 116
  • [26] Applications of gas cluster ion beams for materials processing
    Yamada, Isao
    1996, Elsevier Science S.A., Lausanne, Switzerland (A217-21)
  • [27] On the angular distributions of atoms sputtered by gas cluster ion beam
    Nazarov, Anton V.
    Zavilgelskiy, Andrey D.
    Ieshkin, Alexey E.
    Kireev, Dmitriy S.
    Shemukhin, Andrey A.
    Chernysh, Vladimir S.
    Nordlund, Kai
    Djurabekova, Flyura
    VACUUM, 2023, 212
  • [28] Gas cluster ion beam processing of GaSb and InSb surfaces
    Krishnaswami, K
    Vangala, SR
    Krejca, B
    Allen, LP
    Santeufemio, C
    Dauplaise, H
    Liu, X
    Whitten, J
    Ospina, M
    Sung, C
    Bliss, D
    Goodhue, WD
    RADIATION EFFECTS AND ION-BEAM PROCESSING OF MATERIALS, 2004, 792 : 617 - 622
  • [29] Substrate smoothing using gas cluster ion beam processing
    L. P. Allen
    D. B. Fenner
    V. Difilippo
    C. Santeufemio
    E. Degenkolb
    W. Brooks
    M. Mack
    J. Hautala
    Journal of Electronic Materials, 2001, 30 : 829 - 833
  • [30] Double-step gas cluster ion beam smoothing
    Pelenovich, Vasiliy
    Zeng Xiao-Mei
    Luo Jin-Bao
    Rakhimov, Rakhim
    Zuo Wen-Bin
    Zhang Xiang-Yu
    Tian Can-Xin
    Zou Chang-Wei
    Fu De-Jun
    Yang Bing
    ACTA PHYSICA SINICA, 2021, 70 (05)