Recent developments in gas cluster ion beam technology

被引：0
|
作者：
Toyoda N. [1 ]
机构：
[1] Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji-shi, Hyogo
来源：
Toyoda, Noriaki (ntoyoda@incub.u-hyogo.ac.jp) | 1600年 / Vacuum Society of Japan卷 / 59期
关键词：
29;
D O I：
10.3131/jvsj2.59.121
中图分类号：
学科分类号：
摘要：
Gas cluster ion beam (GCIB) exhibit unique irradiation effects such as dense energy deposition, low-damage irradiation, and surface smoothing effects. Especially, low-damage sputtering of organic materials is one of the hot applications of GCIB. However, it is still necessary to improve beam properties of GCIB. In this paper, we will review characterization of GCIB regarding formation of multiply charged GCIB and effects of collisions with residual gas. As recent applications of GCIB, etching enhancement by introduction of reactive background gas, and a nano-fabrication of magnetic recording device by GCIB are explained.
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页码：121 / 127
页数：6
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