Application of InGaAs/GaAs superlattice-base structure for InGaP/GaAs superlattice-emitter bipolar transistor

被引:10
|
作者
Tsai, Jung-Hui [1 ]
Lee, Yuan-Hong [1 ]
Dale, Ning-Feng [1 ]
Sheng, Jhih-Syuan [1 ]
Ma, Yung-Chun [1 ]
Ye, Sheng-Shiun [1 ]
机构
[1] Natl Kaohsiung Normal Univ, Dept Elect Engn, Kaohsiung 802, Taiwan
关键词
bipolar transistors; energy gap; gallium arsenide; gallium compounds; III-V semiconductors; indium compounds; semiconductor superlattices; tunnelling; HBTS;
D O I
10.1063/1.3302462
中图分类号
O59 [应用物理学];
学科分类号
摘要
The performance of an InGaP/GaAs superlattice-emitter bipolar transistor with InGaAs/GaAs superlattice-base structure is demonstrated by experimental results. The injecting electrons from superlattice emitter are easy to transport into the superlattice-base region for promoting the collector current by tunneling behavior. Furthermore, the average energy gap of base regime is substantially reduced by the use of InGaAs/GaAs superlattice structure for the requirement of low turn-on voltage. Experimentally, the transistor exhibits a maximum common-emitter current gain of 295 and a relatively low collector-emitter offset voltage of only 16 mV. In particular, the ideality factor of collector current near to unity is obtained.
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页数:3
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