Improved Eu Luminescence Properties in Eu-Doped GaN Grown on GaN Substrates by Organometallic Vapor Phase Epitaxy

被引:4
|
作者
Kasai, Hitoshi [1 ]
Nishikawa, Atsushi [1 ]
Kawasaki, Takashi [1 ]
Furukawa, Naoki [1 ]
Terai, Yoshikazu [1 ]
Fujiwara, Yasufumi [1 ]
机构
[1] Osaka Univ, Div Mat & Mfg Sci, Grad Sch Engn, Suita, Osaka 5650871, Japan
关键词
Gallium nitride - Organometallics - Europium compounds - Metallorganic vapor phase epitaxy - Substrates - Sapphire - III-V semiconductors - Luminescence;
D O I
10.1143/JJAP.49.048001
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have grown Eu-doped GaN on a freestanding GaN substrate by organometallic vapor phase epitaxy and investigated its red luminescence that is due to intra-4f shell transitions of Eu3+ ions. The optimum growth temperature for Eu luminescence was 50 degrees C higher than that of Eu-doped GaN on a sapphire substrate. The highest emission intensity was more intense than that on the sapphire substrate, while the Eu luminescence lifetime was identical for both substrates. These results indicate that energy transfer from the GaN host to the Eu3+ ions occurs more efficiently in Eu-doped GaN on the GaN substrate because of a low dislocation density. (C) 2010 The Japan Society of Applied Physics DOI: 10.1143/JJAP.49.048001
引用
收藏
页码:0480011 / 0480012
页数:2
相关论文
共 50 条
  • [31] Properties of freestanding GaN substrates grown by hydride vapor phase epitaxy
    Lee, K
    Auh, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (1AB): : L13 - L15
  • [32] Properties of freestanding GaN substrates grown by hydride vapor phase epitaxy
    Lee, Kyoyeo
    Auh, Keunho
    1600, Japan Society of Applied Physics (40):
  • [33] Photoluminescence properties of Eu-doped GaN by ion implantation
    Nakanishi, Y
    Wakahara, A
    Yoshida, A
    Ohshima, T
    Itoh, H
    Sakai, S
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 486 - 489
  • [34] Characterization and annealing of Eu-doped GaN
    Overberg, M
    Lee, KN
    Abernathy, CR
    Pearton, SJ
    Hobson, WS
    Wilson, RG
    Zavada, JM
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2001, 81 (1-3): : 150 - 152
  • [35] Microstructural properties of Eu-doped GaN luminescent powders
    Contreras, O
    Srinivasan, S
    Ponce, FA
    Hirata, GA
    Ramos, F
    McKittrick, J
    APPLIED PHYSICS LETTERS, 2002, 81 (11) : 1993 - 1995
  • [36] Photoluminescence spectra of Eu-doped GaN
    Sawahata, J.
    Seo, J. W.
    Chen, S.
    Akimoto, K.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (01): : 71 - 74
  • [37] Effect of Growth Mode on Eu-Incorporation and Luminescence of Eu-Doped GaN Epitaxial Film Grown by Plasma-Assisted Molecular Beam Epitaxy
    Park, Ji-Ho
    Wakahara, Akihiro
    Okada, Hiroshi
    Sekiguchi, Hiroto
    Tiwari, Ajay
    Kim, Yong-Tae
    Song, Jonghan
    Lee, Jong-Han
    Jhin, Junggeun
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (03)
  • [38] Structural and optical properties of Eu-doped GaN nanocolumns on (111) Si substrates grown by RF-plasma-assisted molecular beam epitaxy
    Sekiguchi, Hiroto
    Nishikawa, Satoshi
    Imanishi, Tomohiko
    Ozaki, Kohei
    Yamane, Keisuke
    Okada, Hiroshi
    Kishino, Katsumi
    Wakahara, Akihiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2016, 55 (05)
  • [39] Substrate roughness dependence of structural and optical properties of Eu-doped GaN grown by gas source molecular beam epitaxy
    Li, ZQ
    Bang, HJ
    Piao, GX
    Sawahata, J
    Akimoto, K
    Kinoshita, H
    Watanabe, K
    JOURNAL OF CRYSTAL GROWTH, 2002, 234 (01) : 25 - 31
  • [40] Concentration quenching of Eu related luminescence from Eu-doped GaN studied by EXAFS analysis
    Morishima, S
    Bang, H
    Hagio, Y
    Maruyama, T
    Akimoto, K
    Nomura, M
    PROCEEDINGS OF THE INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, 2000, 1 : 490 - 493