Simultaneous subthreshold and gate-oxide tunneling leakage current analysis in nanometer CMOS design

被引:0
|
作者
Lee, DW [1 ]
Kwong, W [1 ]
Blaauw, D [1 ]
Sylvester, D [1 ]
机构
[1] Univ Michigan, Ann Arbor, MI 48109 USA
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D O I
暂无
中图分类号
TP31 [计算机软件];
学科分类号
081202 ; 0835 ;
摘要
In this paper we develop a fast approach to analyze the total leakage power of a large circuit block, considering both gate leakage, I-gate, and subthreshold leakage, I-sub. The interaction between I-sub and I-gate complicates analysis in arbitrary CMOS topologies. We propose simple and accurate heuristics to quickly estimate the state-dependent total leakage current considering the interaction between I-sub and I-gate. We apply this method to ISCAS benchmark circuits in a projected 100nm technology and demonstrate excellent accuracy compared to SPICE simulation with a 20,000X speedup on average.
引用
收藏
页码:287 / 292
页数:6
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