Growth and characterization of silicon carbide nanowires

被引:29
|
作者
Park, BT [1 ]
Ryu, YW [1 ]
Yong, KJ [1 ]
机构
[1] Pohang Univ Sci & Technol, POSTECH, Surface Chem Lab Elect Mat, Dept Chem Engn, Pohang 790784, South Korea
关键词
low dimensional structures; nanowires; growth models; SiC;
D O I
10.1142/S0218625X04006311
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A simple, direct synthesis method was used to grow the core-shell SiC-SiOx nanowires by heating the NiO catalyzed silicon substrate. The carbothermal reduction of WO3 by C provided a reductive environment to synthesize the crystalline SiC nanowires covered with the SiOx sheath in the growth temperature of 1000-1100degreesC. After hydrofluoric acid (HF) etching, the cubic beta-SiC nanowires were extracted from the core-shell nanowires in large quantities. A solid-liquid-solid (SLS) mechanism was proposed for the growth of the core-shell SiC-SiOx nanowires.
引用
收藏
页码:373 / 378
页数:6
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