Catalytic activity of sputtered palladium films for electroless nickel plating studied using a quartz crystal microbalance

被引：0
|
作者：
Kobayakawa, K [1 ]
Morita, M [1 ]
Miyauchi, K [1 ]
Sato, Y [1 ]
Fujimoto, E [1 ]
机构：
[1] Kanagawa Univ, Dept Appl Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan
来源：
PLATING AND SURFACE FINISHING | 2000年 / 87卷 / 09期
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D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
The catalytic activity of palladium films sputtered on a quartz resonator was studied using a nickel bath in which a quartz crystal microbalance was used to determine electroless plating processes. An adhesive interface between the Pd layer and the quartz surface influenced activity. A chromium underlayer suppressed the catalytic activity of Pd film, but a gold underlayer did not. A palladium layer formed on Au a layer operated as a catalyst. The catalytic activity of Pd film on the Cr underlayer was greatly enhanced by cathodic treatment in dilute hydrochloric acid.
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页码：77 / 79
页数：3
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