Catalytic activity of sputtered palladium films for electroless nickel plating studied using a quartz crystal microbalance

被引：0

作者：

Kobayakawa, K ^{[1
]}

Morita, M ^{[1
]}

Miyauchi, K ^{[1
]}

Sato, Y ^{[1
]}

Fujimoto, E ^{[1
]}

机构：

[1] Kanagawa Univ, Dept Appl Chem, Kanagawa Ku, Yokohama, Kanagawa 2218686, Japan

来源：

PLATING AND SURFACE FINISHING | 2000年 / 87卷 / 09期

关键词：

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The catalytic activity of palladium films sputtered on a quartz resonator was studied using a nickel bath in which a quartz crystal microbalance was used to determine electroless plating processes. An adhesive interface between the Pd layer and the quartz surface influenced activity. A chromium underlayer suppressed the catalytic activity of Pd film, but a gold underlayer did not. A palladium layer formed on Au a layer operated as a catalyst. The catalytic activity of Pd film on the Cr underlayer was greatly enhanced by cathodic treatment in dilute hydrochloric acid.

引用

页码：77 / 79

页数：3

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