Analysis of multi layer system with X-ray fluorescence

被引：0
|
作者：
Wittkopp, A [1 ]
Haschke, M
Eicke, A
机构：
[1] Rontgenanalyt Messtech GmbH, Taunusstein, Germany
[2] Zentrum Solar & Wasserstoffforsch, Stuttgart, Germany
来源：
METALL | 2000年 / 54卷 / 11期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
Analysis of multi layer system can be performed non-destructive and contact-less with X-Ray Fluorescence. Especially semiconductor industry and micro sensorics need measuring systems that call analyse the more and more complex systems. This measuring system has to determine not only coating thickness but also the composition of the several layers. In this paper the principles of X-Ray fluorescence for coating thickness testing are referred and the analytical performance of this method is documented for several purposes (Micro sensors, Solar cells).
引用
收藏
页码：662 / 666
页数：5
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