Analytical ramp delay model for distributed on-chip RLC interconnects

被引:0
|
作者
Coulibaly, LM [1 ]
Kadim, HJ [1 ]
机构
[1] Liverpool John Moores Univ, Sch Engn, Liverpool L3 3AF, Merseyside, England
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In the past, gate delay was the dominant factor in determining circuit performance. However, as feature size becomes smaller and chip area becomes larger in integrated circuits, interconnect delay has become an increasingly important factor in determining circuit performance. In this paper, we present an analytical delay calculation approach for a distributed RLC interconnect line that maintains the effectiveness and the efficiency of past RC interconnect models, but significantly improving their accuracy for deep submicron (DSM) designs.
引用
收藏
页码:457 / 460
页数:4
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