Towards nano-process applications with laser-cooled silicon atoms

被引：3

作者：

Kumagai, H ^{[1
]}

Asakawa, Y ^{[1
]}

Midorikawa, K ^{[1
]}

Obara, M ^{[1
]}

机构：

[1] RIKEN, Inst Phys & Chem Res, Laser Technol Lab, Wako, Saitama 3510198, Japan

来源：

THIRD INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 4830卷

关键词：

laser cooling; silicon; deep ultraviolet; deflection; collimation; velocity selection;

D O I：

10.1117/12.486587

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have developed an all-solid-state 252nm coherent light source for laser cooling of silicon atoms with two-stage highly efficient frequency conversions with external cavities. With the coherent light source, it is possible to manipulate the atomic motion of the silicon atoms towards nano-process applications. In this paper, deflection, collimation, and axial velocity selection of the silicon atomic beam with the coherent light source are discussed.

引用

页码：218 / 221

页数：4

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