Towards nano-process applications with laser-cooled silicon atoms

被引：3
|
作者：
Kumagai, H [1 ]
Asakawa, Y [1 ]
Midorikawa, K [1 ]
Obara, M [1 ]
机构：
[1] RIKEN, Inst Phys & Chem Res, Laser Technol Lab, Wako, Saitama 3510198, Japan
来源：
THIRD INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 4830卷
关键词：
laser cooling; silicon; deep ultraviolet; deflection; collimation; velocity selection;
D O I：
10.1117/12.486587
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
We have developed an all-solid-state 252nm coherent light source for laser cooling of silicon atoms with two-stage highly efficient frequency conversions with external cavities. With the coherent light source, it is possible to manipulate the atomic motion of the silicon atoms towards nano-process applications. In this paper, deflection, collimation, and axial velocity selection of the silicon atomic beam with the coherent light source are discussed.
引用
收藏
页码：218 / 221
页数：4
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