Fabrication of ZnO thin films by femtosecond pulsed laser deposition

被引：22
|
作者：
Chau, Joseph Lik Hang [1 ]
Yang, Min-Chieh [2 ]
Nakamura, Takahiro [3 ]
Sato, Shunichi [3 ]
Yang, Chih-Chao [1 ]
Cheng, Chung-Wei [2 ]
机构：
[1] Ind Technol Res Inst, ITRI S, Nanopowder & Thin Film Technol Ctr, Tainan, Taiwan
[2] Ind Technol Res Inst, ITRI S, Laser Applicat & Technol Ctr, Tainan, Taiwan
[3] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, Sendai, Miyagi 980, Japan
来源：
OPTICS AND LASER TECHNOLOGY | 2010年 / 42卷 / 08期
关键词：
Femtosecond; Zinc oxide; Thin films; TEMPERATURE; HYDROGEN;
D O I：
10.1016/j.optlastec.2010.04.015
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The growth of ZnO thin films on sapphire substrate using the femtosecond PLD technique is reported. The effect of substrate temperature and oxygen pressure on the structural properties of the films was studied. Highly c-axis oriented ZnO films can be grown on sapphire substrates under vacuum conditions using the femtosecond PLD process. There is an optimum substrate temperature for the pulsed laser deposition of ZnO film that enhances the thermodynamic stability and allows the formation of well-crystallized thin films. The crystal quality of the films can be further improved by increasing the deposition time and introducing oxygen during the pulsed laser deposition process. (c) 2010 Elsevier Ltd. All rights reserved.
引用
收藏
页码：1337 / 1339
页数：3
相关论文
共 50 条
  • [1] Pulsed laser deposition of ZnO thin films using a femtosecond laser
    Okoshi, M
    Higashikawa, K
    Hanabusa, M
    APPLIED SURFACE SCIENCE, 2000, 154 : 424 - 427
  • [2] Growth of heteroepitaxial ZnO thin films by femtosecond pulsed-laser deposition
    Millon, E
    Albert, O
    Loulergue, JC
    Etchepare, J
    Hulin, D
    Seiler, W
    Perrière, J
    JOURNAL OF APPLIED PHYSICS, 2000, 88 (11) : 6937 - 6939
  • [3] Study of deposition parameters for the fabrication of ZnO thin films using femtosecond laser
    Jaweria Zartaj Hashmi
    Khurram Siraj
    Anwar Latif
    Mathew Murray
    Gin Jose
    Applied Physics A, 2016, 122
  • [4] Study of deposition parameters for the fabrication of ZnO thin films using femtosecond laser
    Hashmi, Jaweria Zartaj
    Siraj, Khurram
    Latif, Anwar
    Murray, Mathew
    Jose, Gin
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2016, 122 (08):
  • [5] Femtosecond pulsed laser deposition of silicon thin films
    Murray, Matthew
    Jose, Gin
    Richards, Billy
    Jha, Animesh
    NANOSCALE RESEARCH LETTERS, 2013, 8 : 1 - 6
  • [6] Femtosecond pulsed laser deposition of silicon thin films
    Matthew Murray
    Gin Jose
    Billy Richards
    Animesh Jha
    Nanoscale Research Letters, 8
  • [7] Thin ZnO films produced by pulsed laser deposition
    Dikovska, AO
    Atanasov, PA
    Vasilev, C
    Dimitrov, IG
    Stoyanchov, TR
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2005, 7 (03): : 1329 - 1334
  • [8] ZnO thin films prepared by pulsed laser deposition
    Tsoutsouva, M. G.
    Panagopoulos, C. N.
    Papadimitriou, D.
    Fasaki, I.
    Kompitsas, M.
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2011, 176 (06): : 480 - 483
  • [9] Preparation of ZnO thin films by pulsed laser deposition
    School of Materials Science and Engineering, Changchun University of Technology, Changchun 130012, China
    不详
    Zhongguo Jiguang, 2007, 4 (534-537):
  • [10] Advances of pulsed laser deposition of ZnO thin films
    Lorenz, M
    Hochmuth, H
    Schmidt-Grund, R
    Kaidashev, EM
    Grundmann, M
    ANNALEN DER PHYSIK, 2004, 13 (1-2) : 59 - 60
12345