Characteristics of Ce-Doped ZrO2 Dielectric Films Prepared by a Solution Deposition Process

被引:12
|
作者
Lee, Myung Soo [1 ]
An, Chee-Hong [1 ]
Lim, Jun Hyung [2 ]
Joo, Jin-Ho [1 ]
Lee, Hoo-Jeong [1 ]
Kim, Hyoungsub [1 ]
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
[2] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
关键词
CONDUCTION MECHANISM; THIN-FILMS; ZIRCONIA; DEVICES; OXIDE; CERIA;
D O I
10.1149/1.3367749
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The microstructural and electrical properties of sol-gel deposited ultrathin Zr1-xCexO2 films with different Ce contents (x = 0, 0.1, 0.3, and 0.5) were studied using various characterization tools. Ce doping reduced the crystallization (densification) temperature and increased the dielectric constant of the Zr1-xCexO2 film. There was no degradation of the hysteresis characteristics, and a systematic negative shift in the flatband voltage was observed by incorporating Ce atoms. Leakage current measurements showed no detrimental effects of Ce doping up to x = 0.5, and the conduction mechanism analyses revealed that the Zr1-xCexO2 films follow a Poole-Frenkel (PF) conduction, exhibiting a systematic increase in the linear slope of the PF plot possibly due to the decrease in dielectric trap sites with increasing Ce content. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3367749] All rights reserved.
引用
收藏
页码:G142 / G146
页数:5
相关论文
共 50 条
  • [21] Structure and dielectric properties of ultra-thin ZrO2 films for high-k gate dielectric application prepared by pulsed laser deposition
    Zhu, J
    Liu, ZG
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2004, 78 (05): : 741 - 744
  • [22] Electrical and electro-optical properties of Ce-doped barium titanate thin films prepared by pulsed laser deposition
    Liu, YW
    Chen, ZH
    Li, CL
    Cui, DF
    Zhou, YL
    Yang, GZ
    JOURNAL OF APPLIED PHYSICS, 1997, 81 (09) : 6328 - 6331
  • [23] Preparation and thermal-insulating properties of Ce-doped ZrO2 hollow fibers derived from a metaplexis template
    Zhang, Zihao
    Wang, Tianchi
    Dai, Changhao
    Li, Qi
    Li, Yicong
    Kong, Jian
    INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY, 2019, 16 (04) : 1581 - 1589
  • [24] Structure and dielectric properties of ultra-thin ZrO2 films for high-k gate dielectric application prepared by pulsed laser deposition
    J. Zhu
    Z.G. Liu
    Applied Physics A, 2004, 78 : 741 - 744
  • [25] Structural, optical, and dielectric characteristics of Fe doped ZrO2 nanoparticles for multifunctional applications
    Rohini, B. S.
    Kavyashree, D.
    Lavanya, D. R.
    Sunitha, D. V.
    Nagabhushana, H.
    PHYSICS LETTERS A, 2024, 525
  • [26] Antiferroelectric properties of ZrO2 ultra-thin films prepared by atomic layer deposition
    Luo, Xuan
    Toprasertpong, Kasidit
    Takenaka, Mitsuru
    Takagi, Shinichi
    APPLIED PHYSICS LETTERS, 2021, 118 (23)
  • [27] Rh-nanoparticle-dispersed ZrO2 films prepared by laser chemical vapor deposition
    Honda, Akihiro
    Kimura, Teiichi
    Ito, Akihiko
    Goto, Takahi
    SURFACE & COATINGS TECHNOLOGY, 2012, 206 (11-12): : 3006 - 3010
  • [28] DEPOSITION AND STRUCTURAL CHARACTERIZATION OF ZRO2 AND YTTRIA-STABILIZED ZRO2 FILMS BY CHEMICAL-VAPOR-DEPOSITION
    KIM, JS
    MARZOUK, HA
    REUCROFT, PJ
    THIN SOLID FILMS, 1995, 254 (1-2) : 33 - 38
  • [29] Optical inhomogeneity and microstructure of ZrO2 thin films prepared by ion-assisted deposition
    Cho, HJ
    Hwangbo, CK
    APPLIED OPTICS, 1996, 35 (28): : 5545 - 5552
  • [30] Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100)
    Jeon, TS
    White, JM
    Kwong, DL
    APPLIED PHYSICS LETTERS, 2001, 78 (03) : 368 - 370