Electrical conductivity of SrRuO3 thin films prepared by laser ablation

被引:2
|
作者
Ito, A [1 ]
Masumoto, H [1 ]
Goto, T [1 ]
机构
[1] Tohoku Univ, Mat Res Inst, Sendai, Miyagi 9808577, Japan
关键词
laser ablation; SrRuO3; conductive oxide; thin film; epitaxial growth; electrical property;
D O I
10.4028/www.scientific.net/MSF.475-479.1209
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
SrRuO3 (SRO) thin films were prepared by laser ablation. The optimum preparation condition of highly electrically conductive SRO thin films was investigated. The substrate temperature (Tub) was changed from room temperature to 973 K, and the deposition atmosphere was at a high vacuum (P = 10(-6) Pa) and in O-2 at oxygen pressures (P-O2) of 0.13 and 13 Pa. The films deposited at P = 10(-6) Pa and P-O2, = 0.13 Pa were amorphous structure. At T-sub > 573 K and P-O2, = 13 Pa. well-crystallized pseudo-cubic SRO thin films with (110) orientation were obtained. With increasing T-sub, the conductivity of SRO films increased from 7.7 x 10(3) to 9.1 X 10(4) S(.)m(-1). The epitaxially grown SRO films on (100) SrTiO3 substrates exhibited the highest conductivity of 1.8 x 10(5) S(.)m(-1).
引用
收藏
页码:1209 / 1212
页数:4
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